MAKE A MEME View Large Image Extreme Ultraviolet Photoresists (5881382243).jpg NIST researchers exposed a 300 mm silicon wafer with incrementally increasing doses of extreme ultraviolet light EUV in 15 areas After the wafer was developed the team determined that the ...
View Original:Extreme Ultraviolet Photoresists (5881382243).jpg (849x509)
Download: Original    Medium    Small Thumb
Courtesy of:commons.wikimedia.org More Like This
Keywords: Extreme Ultraviolet Photoresists (5881382243).jpg NIST researchers exposed a 300 mm silicon wafer with incrementally increasing doses of extreme ultraviolet light EUV in 15 areas After the wafer was developed the team determined that the seventh exposure was the minimum dose required E0 to fully remove the resist Credit NIST Disclaimer Any mention of commercial products within NIST web pages is for information only; it does not imply recommendation or endorsement by NIST Use of NIST Information These World Wide Web pages are provided as a public service by the National Institute of Standards and Technology NIST With the exception of material marked as copyrighted information presented on these pages is considered public information and may be distributed or copied Use of appropriate byline/photo/image credits is requested https //www flickr com/photos/usnistgov/5881382243/ Extreme Ultraviolet Photoresists 2008-06-24 13 52 https //www flickr com/people/63059536 N06 National Institute of Standards and Technology PD-USGov National Institute of Standards and Technology https //flickr com/photos/63059536 N06/5881382243 2016-09-07 02 52 08 United States Government Work Uncategorized 2016 December 20
Terms of Use   Search of the Day